Mechanical Stress in InP Structures Etched in an Inductively Coupled Plasma Reactor with Ar/Cl2/CH4 Plasma Chemistry
نویسندگان
چکیده
منابع مشابه
Integrated plasma equipment model for polysilicon etch profiles in an inductively coupled plasma reactor with subwafer and superwafer topography
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ژورنال
عنوان ژورنال: Journal of Electronic Materials
سال: 2018
ISSN: 0361-5235,1543-186X
DOI: 10.1007/s11664-018-6152-6